Abstract
Scatterless SiO2/Nb2O5 multi-layered UV-IR cut filters can be prepared by biased RAS (Radical Assisted Sputtering) system. By this biased RAS system, ion bombardment toward the large-area film surface occurs at the same time as sputtering, which results in the smooth and uniform film surface. Using the ion bombardment effect, therefore, the extreme-low scatter and excellent UV and near-IR blocking characteristics can be achieved for the SiO2/Nb2O5 multi-layered filters.
© 2016 Optical Society of America
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