Abstract

Scatterless SiO2/TiO2 multi-layered thick UV-IR cut filter can be prepared by the new IAD method called EPD (Effective Physical vapor Deposition). In the EPD system, the ion beam (IB) from the ion source is concentrated and irradiated to one part of the rotating substrate holder and thus the substrates undergo the high density and intermittent pulsed IB irradiation. Using this EPD system, the deposition of the optical filters of the low scatter and low stress with a dense microstructure can be achieved toward to the large-area under a high rate.

© 2016 Optical Society of America

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