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Effect of Sputter Pressure on the Optical Properties of Sputter-Deposited Titanium Oxide Thin films

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Abstract

The refractive index of the titanium oxide thin films deposited with DC magnetron sputtering was tuned by adjusting the sputtering gas pressure during deposition. This effect may be exploited for the fabrication of optical interference coatings.

© 2013 Optical Society of America

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