Plasma Assisted Pulsed DC Magnetron Sputtering System for Optical Thin Film Coatings

Keqi Zhang; Ralph Faber

doi:10.1364/OIC.2013.ThB.6

Optical Interference Coatings
OSA Technical Digest (online) (Optica Publishing Group, 2013),
paper ThB.6
•https://doi.org/10.1364/OIC.2013.ThB.6

Plasma Assisted Pulsed DC Magnetron Sputtering System for Optical Thin Film Coatings

Keqi Zhang and Ralph Faber

Optical Interference Coatings 2013

Whistler Canada
16–21 June 2013
ISBN: 978-1-55752-970-1

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Sputter Deposition (ThB)

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K. Zhang and R. Faber, "Plasma Assisted Pulsed DC Magnetron Sputtering System for Optical Thin Film Coatings," in Optical Interference Coatings, M. Tilsch and D. Ristau, eds., OSA Technical Digest (online) (Optica Publishing Group, 2013), paper ThB.6.

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Abstract

Using plasma assisted pulsed DC magnetron sputtering technology, low loss, high performance optical coatings have been achieved. Multi-layer coating examples using Ta₂O₅ and SiO₂ materials are demonstrated. This technology is suitable for volume production.

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