Zr/Mg multilayer mirror for extreme ultraviolet application

Jingtao Zhu; Haochuan Li; Sika Zhou; Zhanshan Wang; Hong Chen; Philippe Jonnard; Karine Le Guen; Jean-Michel André

doi:10.1364/OIC.2013.FC.2

Optical Interference Coatings
OSA Technical Digest (online) (Optica Publishing Group, 2013),
paper FC.2
•https://doi.org/10.1364/OIC.2013.FC.2

Zr/Mg multilayer mirror for extreme ultraviolet application

Jingtao Zhu, Haochuan Li, Sika Zhou, Zhanshan Wang, Hong Chen, Philippe Jonnard, Karine Le Guen, and Jean-Michel André

Optical Interference Coatings 2013

Whistler Canada
16–21 June 2013
ISBN: 978-1-55752-970-1

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UV-EUV Coatings (FC)

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J. Zhu, H. Li, S. Zhou, Z. Wang, H. Chen, P. Jonnard, K. Le Guen, and J. André, "Zr/Mg multilayer mirror for extreme ultraviolet application," in Optical Interference Coatings, M. Tilsch and D. Ristau, eds., OSA Technical Digest (online) (Optica Publishing Group, 2013), paper FC.2.

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Abstract

A novel Zr/Mg multilayer mirror for extreme ultraviolet (EUV) spectral range was proposed and deposited by magnetron sputtering. The near-normal-incidence reflectance of Zr/Mg multilayer is 30.6% at He emission line (λ=30.4 nm). The reflectance slightly decreases with annealing temperature when not above 500°C and eventually drops to 15.1% at 600°C. Zr/Mg is a promising multilayer for EUV applications for its high reflectivity and thermal stability.

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