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Conferences > OIC > 2013 > FA > FA.7

Reactive, Ion-Assisted Deposition of E-Beam Evaporated Ti for High Refractive Index TiO2 Layers and Laser Damage Resistant, Broad Bandwidth, High Reflection Coatings

John Bellum, Ella Field, Damon Kletecka, and Finis Long

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Abstract

We optimize reactive, ion-assisted deposition (O2 levels, deposition rate and ion beam settings) using e-beam evaporated Ti for high refractive index, low absorption TiO2 layers and laser damage resistant, broad bandwidth high reflection coatings.

© 2013 Optical Society of America

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