Abstract

An in-situ monitoring system was developed and integrated into a magnetron sputtering system equipped with a Sentech SE 401 single wavelength ellipsometer, including the engineering of software for in-situ process control. Using that software the system allows direct monitoring of the layer thickness on a moving substrate. It is shown that it is also possible to determine the complex index of refraction from the distribution of measurements depending on the layer thickness. A strategy has been deployed for in-situ reverse thickness engineering of the top layers to compensate measurement errors.

© 2010 Optical Society of America