Empirical Models for the prediction of density and refractive index of optical thin film materials as a function of processing parameters during ion assisted evaporation have been developed for Ta2O5 (TiO2, SiO2 and MgF2 under way). These models have been implemented in a computer program for the simulation of evaporation processes in order to predict the spatial distribution of film thickness, film density and film refractive index on optical substrates. Good agreement between theory and experiment is achieved.

© 2010 Optical Society of America

PDF Article


You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
Login to access OSA Member Subscription