Laterally Graded Mo/Si Multilayer for a 5 Steradian EUV Collector

M. Perske; H. Pauer; S. Yulin; V. Nesterenko; M. Schürmann; T. Feigl; N. Kaiser

doi:10.1364/OIC.2010.MD3

Optical Interference Coatings
OSA Technical Digest (Optica Publishing Group, 2010),
paper MD3
•https://doi.org/10.1364/OIC.2010.MD3

Laterally Graded Mo/Si Multilayer for a 5 Steradian EUV Collector

M. Perske, H. Pauer, S. Yulin, V. Nesterenko, M. Schürmann, T. Feigl, and N. Kaiser

Optical Interference Coatings 2010

Tucson, Arizona United States
6–11 June 2010
ISBN: 978-1-55752-891-9

From the session
UV (MD)

Not Accessible

Your library or personal account may give you access

Get PDF
Email
Share
Get Citation
Copy Citation Text
M. Perske, H. Pauer, S. Yulin, V. Nesterenko, M. Schürmann, T. Feigl, and N. Kaiser, "Laterally Graded Mo/Si Multilayer for a 5 Steradian EUV Collector," in Optical Interference Coatings, OSA Technical Digest (Optica Publishing Group, 2010), paper MD3.

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Citation alert
Save article

Abstract

The deposition of laterally graded Mo/Si multilayers for EUV collector optics is one of the key challenges to bring EUV Lithography to high volume manufacturing. Coating results of the world’s largest EUV collector are presented.

PDF Article

More Like This

EUV multilayer optics at the Fraunhofer IOF

Norbert Kaiser, Sergiy Yulin, Torsten Feigl, Nicolas Benoit, and Andreas Tünnermann
FA2 Optical Interference Coatings (OIC) 2007

EUV and soft X-ray multilayer coatings

Norbert Kaiser, Sergiy Yulin, and Torsten Feigl
WF10 Optical Interference Coatings (OIC) 2004

Heat-Resistance of Mo/Si Multilayer EUV Mirrors with Interleaved Carbon Barrier-Layers

Hisataka Takenaka, Tomoaki Kawamura, and Tsuneyuki Haga
RMC169 Extreme Ultraviolet Lithography (EUL) 1996

Previous Article Next Article