Enhancing the Optical and Electrical Properties of SnO2 Films by Plasma Etching Deposition

Bo-Huei Liao; Cheng-Chung Lee; Chien-Cheng Kuo; Ping-Zen Chen

doi:10.1364/OIC.2010.MC5

Optical Interference Coatings
OSA Technical Digest (Optica Publishing Group, 2010),
paper MC5
•https://doi.org/10.1364/OIC.2010.MC5

Enhancing the Optical and Electrical Properties of SnO₂ Films by Plasma Etching Deposition

Bo-Huei Liao, Cheng-Chung Lee, Chien-Cheng Kuo, and Ping-Zen Chen

Optical Interference Coatings 2010

Tucson, Arizona United States
6–11 June 2010
ISBN: 978-1-55752-891-9

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Coatings for Solar Applications (MC)

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B. Liao, C. Lee, C. Kuo, and P. Chen, "Enhancing the Optical and Electrical Properties of SnO2 Films by Plasma Etching Deposition," in Optical Interference Coatings, OSA Technical Digest (Optica Publishing Group, 2010), paper MC5.

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Abstract

Fluorine-doped tin oxide films have been deposited by plasma etching deposition with Sn target. The extinction coefficient is less than 1.5×10⁻³ in the range of 400nm to 800nm and the lowest resistitivuty is 1.5×10⁻³ Ω-cm.

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