Improvement of Effective Lifetime in Negative Charge Material Deposited by Ion Beam Sputter for C-Silicon Solar Cells

Sheng-Hui Chen; Chun-Che Hsu; Hung-Ju Lin; Chi-Li Yeh; Shao-Ze Tseng; Chorng-Jye Huang

doi:10.1364/OIC.2010.MC3

Optical Interference Coatings
OSA Technical Digest (Optica Publishing Group, 2010),
paper MC3
•https://doi.org/10.1364/OIC.2010.MC3

Improvement of Effective Lifetime in Negative Charge Material Deposited by Ion Beam Sputter for C-Silicon Solar Cells

Sheng-Hui Chen, Chun-Che Hsu, Hung-Ju Lin, Chi-Li Yeh, Shao-Ze Tseng, and Chorng-Jye Huang

Optical Interference Coatings 2010

Tucson, Arizona United States
6–11 June 2010
ISBN: 978-1-55752-891-9

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Coatings for Solar Applications (MC)

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S. Chen, C. Hsu, H. Lin, C. Yeh, S. Tseng, and C. Huang, "Improvement of Effective Lifetime in Negative Charge Material Deposited by Ion Beam Sputter for C-Silicon Solar Cells," in Optical Interference Coatings, OSA Technical Digest (Optica Publishing Group, 2010), paper MC3.

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Abstract

Based on the ion beam sputter deposition, the negative-charge material- aluminum oxynitride has been fabricated to be passivation layer. The effective lifetime of C-silicon solar cell is improved 3 times using the negative-charge material.

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