Abstract

Based on the ion beam sputter deposition, the negative-charge material- aluminum oxynitride has been fabricated to be passivation layer. The effective lifetime of C-silicon solar cell is improved 3 times using the negative-charge material.

© 2010 Optical Society of America

PDF Article
More Like This
Effect of Thermal Annealing on the Residual Stress of Graded-index-like Films Deposited by RF Ion-Beam Sputtering

Chien-Jen Tang, Cheng-Chung Jaing, Kun-Hsien Lee, and Cheng-Chung Lee
WD8 Optical Interference Coatings (OIC) 2010

Silicon Heterojunction Solar Cells Fabricated by Sputtering

Shao-Ze Tseng, Wei-Ting Lin, Hsuan-Wen Wang, and Sheng-Hui Chen
JW6A.18 Optical Instrumentation for Energy and Environmental Applications (E2) 2014

Scandium oxide thin films deposited by dual ion beam sputtering for high-power laser applications

E. M. Krous, D. Patel, P. Langston, C. S. Menoni, A. Markosyan, R. K. Route, M. M. Fejer, D. Nguyen, L. A. Emmert, and W. Rudolph
FA10 Optical Interference Coatings (OIC) 2010

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription