Preparation of MgF2-SiO2 Thin Films with Low Refractive Index by Sol-gel Process

H. Ishizawa; T. Murata; A. Tanaka

doi:10.1364/OIC.2007.ThD9

Optical Interference Coatings
OSA Technical Digest (CD) (Optica Publishing Group, 2007),
paper ThD9
•https://doi.org/10.1364/OIC.2007.ThD9

Preparation of MgF₂-SiO₂ Thin Films with Low Refractive Index by Sol-gel Process

H. Ishizawa, T. Murata, and A. Tanaka

Optical Interference Coatings 2007

Tucson, Arizona United States
3–8 June 2007
ISBN: 1-55752-841-1

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Applications II / Antireflection Coatings (ThD)

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H. Ishizawa, T. Murata, and A. Tanaka, "Preparation of MgF2-SiO2 Thin Films with Low Refractive Index by Sol-gel Process," in Optical Interference Coatings, OSA Technical Digest (CD) (Optica Publishing Group, 2007), paper ThD9.

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Abstract

The porous MgF₂-SiO₂ film with low refractive index of 1.26 was made by sol-gel process. The film was consisted of MgF₂ particles and SiO₂ binder connecting them. The refractive index of the film was variable with the conditions of the wet coating process.

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