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Characterization of Low Level Losses in Optical Thin Films

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Abstract

Characterization of high performance films (at the ppm level) present special challenges and require special metrology. We review some of the approaches and instrumentation used to support the challenging film and material characterizations tasks facing the thin film community presented by NSF Programs such UGO, the VIRGO Project and other Programs. Comparisons of the advantages and limitations of these systems are reviewed. Examples of typical results are presented concluding with a discussion of future directions.

© 2007 Optical Society of America

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