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Instrument for the Measurement of EUV Reflectance and Scattering – MERLIN

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Abstract

A new system is presented for measurements of angle resolved scatter and reflectance at 13.5 nm in the extreme ultraviolet spectral range. The system enables the at-wavelength characterization of EUV optical components. Examples are presented for Mo/Si multilayers deposited onto super polished substrates.

© 2007 Optical Society of America

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