High-Performance Optical Coatings for VUV Lithography Application

Christoph Zaczek; Alexandra Pazidis; Horst Feldermann

doi:10.1364/OIC.2007.FA1

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Optical Interference Coatings 2007

Tucson, Arizona United States
3–8 June 2007
ISBN: 1-55752-841-1

From the session
Short and Intense Wavelength Coatings (FA)

High-Performance Optical Coatings for VUV Lithography Application

Christoph Zaczek, Alexandra Pazidis, and Horst Feldermann

Optical Interference Coatings
OSA Technical Digest (CD) (Optical Society of America, 2007),
paper FA1
•https://doi.org/10.1364/OIC.2007.FA1

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C. Zaczek, A. Pazidis, and H. Feldermann, "High-Performance Optical Coatings for VUV Lithography Application," in Optical Interference Coatings, OSA Technical Digest (CD) (Optical Society of America, 2007), paper FA1.

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Related Topics
Optics & Photonics Topics
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The topics in this list come from the OSA Optics and Photonics Topics applied to this article.
Previously assigned OCIS codes
- Thin films (310.0310)
- Deposition and fabrication (310.1860)
- Thin films, optical properties (310.6860)

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Abstract

Top level requirements and challenges for the optical coatings in the latest generation of 193nm lithography optics are presented. Emphasis is placed on the influence of different parameters on the optical properties of such coatings.

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Abstract

Optical Interference Coatings 2007

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