We have been developing optical coatings of fluoride materials fabricated by Ion Beam Sputtering method, especially for excimer laser lithography. An anti-reflection coating with a transmittance of 99.6% at wavelength of 193.4nm is achieved.

© 2004 Optical Society of America

PDF Article
More Like This
Post-fluorination of fluoride films for VUV lithography in order to improve their optical properties

Yusuke Taki, Shunji Watanabe, and Akira Tanaka
WF7 Optical Interference Coatings (OIC) 2004

Fluoride antireflection coatings at 193nm by resistive heating boat

Ming-Chung Liu, Cheng-Chung Lee, Masaaki Kaneko, Kazuhide Nakahira, and Yuuichi Takano
FA7 Optical Interference Coatings (OIC) 2007

Ion Beam Sputtering Deposition of Fluoride Thin Films for 193 nm Applications

Aiko Ode
FC.8 Optical Interference Coatings (OIC) 2013


You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
Login to access Optica Member Subscription