Real time process control and monitoring in multi-layer filter deposition.

Svetlana Dligatch; Roger P. Netterfield

doi:10.1364/OIC.2004.TuE5

Optical Interference Coatings
OSA Technical Digest Series (Optica Publishing Group, 2004),
paper TuE5
•https://doi.org/10.1364/OIC.2004.TuE5

Real time process control and monitoring in multi-layer filter deposition.

Svetlana Dligatch and Roger P. Netterfield

Optical Interference Coatings 2004

Tucson, Arizona United States
27 June–2 July 2004
ISBN: 3-5400-0364-9

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Monitoring (TuE)

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S. Dligatch and R. P. Netterfield, "Real time process control and monitoring in multi-layer filter deposition.," in Optical Interference Coatings, OSA Technical Digest Series (Optica Publishing Group, 2004), paper TuE5.

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Abstract

We report on the progress in real-time deposition control in the fabrication of non-quarter-wave multi-layer optical designs with demanding specifications. A combination of real-time ellipsometric and spectrophotometric monitoring was used to achieve sub-nanometer accuracy.

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