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Conferences > OFT > 2017 > OTu1B > OTu1B.3

Wet chemical etching with KOH solutions for fused silica optics manufacturing

Philippe Cormont, Mathilde Pfiffer, Evelyne Fargin, Bruno Bousquet, Marc Dussauze, Sébastien Lambert, and Jérôme Néaruport

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Abstract

We tested KOH solution as an alternative to HF solution for deep etching operation on fused silica optics. KOH and HF solutions gave very high laser damage resistance on scratches but surface quality is not deteriorated by KOH solution.

© 2017 Optical Society of America

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