Simultaneous measurement of the full-field aberration

Chao-Wen Liang; Pen-I Liao

doi:10.1364/OFT.2010.OTuA3

International Optical Design Conference and Optical Fabrication and Testing
OSA Technical Digest (CD) (Optica Publishing Group, 2010),
paper OTuA3
•https://doi.org/10.1364/OFT.2010.OTuA3

Simultaneous measurement of the full-field aberration

Chao-Wen Liang and Pen-I Liao

Optical Fabrication and Testing 2010

Jackson Hole, Wyoming United States
13–17 June 2010
ISBN: 978-1-55752-893-3

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Specification and Measurement (OTuA)

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C. Liang and P. Liao, "Simultaneous measurement of the full-field aberration," in International Optical Design Conference and Optical Fabrication and Testing , OSA Technical Digest (CD) (Optica Publishing Group, 2010), paper OTuA3.

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Abstract

A modified grating-slit test is shown to measure the full-field aberration at multi fields simultaneously by adding a slit-lens matching array. Experimental results shows sensitivity to observe changing off-axis aberration of a tilt lens.

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