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Conferences > OFT > 2006 > OFTuC > OFTuC1

High-Index Materials for UV Lithography Optics

John H. Burnett

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Abstract

A survey of candidate high-index lens materials for UV lithography optics is presented. These materials may enable extension of 193 nm immersion lithography to smaller feature sizes, while reducing lens system sizes.

© 2006 Optical Society of America

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