Process Tuning of Silica Thin-Film Deposition

J. Keck; J. B. Oliver; V. Gruschow; J. Spaulding; J. Howe

doi:10.1364/OFT.2004.OMB4

Frontiers in Optics 2004/Laser Science XXII/Diffractive Optics and Micro-Optics/Optical Fabrication and Testing
OSA Technical Digest (CD) (Optica Publishing Group, 2004),
paper OMB4
•https://doi.org/10.1364/OFT.2004.OMB4

Process Tuning of Silica Thin-Film Deposition

J. Keck, J. B. Oliver, V. Gruschow, J. Spaulding, and J. Howe

Optical Fabrication and Testing 2004

Rochester, New York United States
11–13 October 2004
ISBN: 1-55752-779-2

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J. Keck, J. B. Oliver, V. Gruschow, J. Spaulding, and J. Howe, "Process Tuning of Silica Thin-Film Deposition," in Frontiers in Optics 2004/Laser Science XXII/Diffractive Optics and Micro-Optics/Optical Fabrication and Testing, OSA Technical Digest (CD) (Optica Publishing Group, 2004), paper OMB4.

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Abstract

Use of high-resolution deposition-rate monitoring and programmatic control of electron-beam position results in improvements in rate consistency and uniformity of source depletion during SiO₂ thin-film deposition by electron-beam evaporation.

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