Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Optical System for EUV Lithography

Not Accessible

Your library or personal account may give you access

Abstract

A four mirror imaging system for a prototype EUV lithography tool has been fabricated, assembled, and aligned using a preliminary set of ultra-precise mirror substrates. The optical elements include three aspheric surfaces and meet a figure accuracy requirement of 0.5 nm rms. These elements were assembled into a precision housing and were aligned using visible light interferometry and then validated using synchrotron radiation. Excellent agreement was recorded from these two measurements with a wavefront error of 1.67 nm rms, including higher-order terms. A second set of mirrors is being fabricated to achieve diffraction-limited imaging (λ = 13.4 nm).

© 2000 Optical Society of America

PDF Article
More Like This
Optical Technology for EUV Lithography

Masaaki Ito, Souichi Katagiri, Hiromasa Yamanashi, Eiichi Seya, Taro Ogawa, Hiroaki Oizumi, and Tsuneo Terasawa
EWW9 Extreme Ultraviolet Lithography (EUL) 1996

Surface characterization of optics for EUV lithography

D. P. Gaines, D.W. Sweeney, K.W. DeLong, S.P. Vernon, S.L. Baker, D. A. Tichenor, and R. Kestner
OF103 Extreme Ultraviolet Lithography (EUL) 1996

The Fabrication and Testing of Optics for EUV Projection Lithography1,2

John S. Taylor, Gary E. Sommargren, Donald W. Sweeney, Russell M. Hudyma, and Eric M. Gullikson
OTuD.1 Optical Fabrication and Testing (OF&T) 1998

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved