Ultra-low loss and fabrication tolerant silicon nitride (Si3N4) (de-)muxes for 1-μm CWDM optical interconnects

Stanley Cheung; Michael R. T. Tan

doi:10.1364/OFC.2020.M3F.6

Optical Fiber Communication Conference (OFC) 2020
OSA Technical Digest (Optica Publishing Group, 2020),
paper M3F.6
•https://doi.org/10.1364/OFC.2020.M3F.6

Ultra-low loss and fabrication tolerant silicon nitride (Si₃N₄) (de-)muxes for 1-μm CWDM optical interconnects

Stanley Cheung and Michael R. T. Tan

Optical Fiber Communication Conference 2020

San Diego, California United States
8–12 March 2020
ISBN: 978-1-943580-71-2

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Wavelength Selective Devices (M3F)

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S. Cheung and M. R. T. Tan, "Ultra-low loss and fabrication tolerant silicon nitride (Si3N4) (de-)muxes for 1-μm CWDM optical interconnects," in Optical Fiber Communication Conference (OFC) 2020, OSA Technical Digest (Optica Publishing Group, 2020), paper M3F.6.

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Abstract

Low-loss, fabrication-tolerant Si₃N₄ CWDM lattice filters and AWGs are demonstrated for 990 – 1065nm bottom-emitting VCSELs. Channel separation of 25 nm, XT < -35 dB and −20 dB are reported with temperature shift of 14.5 pm/°C.

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