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2×2 Multimode Interference Coupler with Low Loss Using 248 nm Photolithography

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Abstract

We demonstrate a 2×2 multimode interference coupler in 220 nm silicon photonics, with 3.8 μm by 152 μm footprint. Loss is ≤0.15±0.01 dB for 1530-1565 nm, across the 200 mm wafer using 248 nm lithography. This is the lowest loss reported for sub-micron silicon 2×2 MMI.

© 2016 Optical Society of America

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