Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > OFC > 2010 > OWJ > OWJ6

High Efficiency Nonuniform Grating Coupler by Utilizing the Lag Effect in the Dry Etching Process

Yongbo Tang, Zhechao Wang, Urban Westergren, and Lech Wosinski

Not Accessible

Your library or personal account may give you access

Abstract

Utilizing the lag effect in dry etching, a nonuniform silicon-on-insulator grating coupler is designed and fabricated. Over 80% (>−1dB) coupling efficiency is theoretically obtained and experimental coupling efficiency of 55% is achieved for TE polarization.

© 2010 IEEE Communications Society, IEEE Photonics Society, OSA, Telcordia

PDF Article
More Like This
CMOS-Compatible Silicon Double-etched Apodized Waveguide Grating Couplers for High Efficient Coupling

Chao Li, Huijuan Zhang, Mingbin Yu, and G. Q. Lo
OW3F.2 Optical Fiber Communication Conference (OFC) 2013

Gray Scale E-beam Lithography to Fabricate 3D Micro-sized Waveguide and Grating Coupler in SU-8

Lin Dong, Srinivasan Iyer, Sergei Popov, and Ari Friberg
JWA24 Frontiers in Optics (FiO) 2010

Fully-Etched Photonic Crystal Grating Coupler as an Interface between Single-Mode Fibers and Photonic Circuits on Silicon-on-Insulator

Liu Liu, Minhao Pu, Kresten Yvind, and Jørn M. Hvam
OWJ2 Optical Fiber Communication Conference (OFC) 2010

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use