Author Affiliations
L.K. Oxenløwe,1,* F. Gomez Agis,2 C. Ware,2 S. Kurimura,3 H.C.H. Mulvad,1 M. Galili,1 K. Kitamura,3 H. Nakajima,4 J. Ichikawa,5 D. Erasme,2 A.T. Clausen,1 and P. Jeppesen1
1DTU Fotonik, Technical University of Denmark, Building 343, DK-2800 Kgs. Lyngby,
Denmark
2Institut TELECOM, TELECOM ParisTech, LTCI CNRS, 46 rue Barrault, 75634 Paris CEDEX 13,
France
3National Institute for Materials Science, 1-1, Namiki, Tsukuba 305-0044,
Japan
4Graduate School of Science and Technology, Waseda University, 3-4-1, Okubo, Shinjuku-ku, Tokyo 169-8555,
Japan
5New Technology Research Laboratories, Sumitomo Osaka Cement Co. Ltd. 585, Toyotomi-cho, Funabashi-shi, Chiba 274-8601,
Japan
*Corresponding author: lo@com.dtu.dk