The plasma-impulse-CVD (PICVD) process is especially suited for the fabrication of optical fibers with pure silica core. The plasma-enhanced reaction and deposition of gaseous layers allow a nearly 100% efficiency of SiO2 formation and the possibility of doping with high fluorine content.1,2 Thus both single-mode and multimode fibers show many advantages.

© 1988 Optical Society of America

PDF Article


You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
Login to access OSA Member Subscription