Research on the PMCVD1,3 process has resulted in Improvements in fabrication rate and preparation of a wide variety of lightguide structures. A centered, atmospheric pressure, oxygen plasma maintained by an rf power supply operating at 3.5 MHz, provides an intense thermophoretic driving force which results in high deposition rates.2 A newly designed remote oscillator circuit allows the maintenance of a stable plasma fireball at higher power densities and Increased reactant mass flows. This improved plasma stability allows the use of larger diameter substrate tubes with the potential for higher deposition rates than previously obtainable by PMCVD.

© 1985 Optical Society of America

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