A reactive-ion etching process, can be optimized to fabricate an angle of incidence independent, anti-reflective, random-structured novel material; and can be tailored to shift the nearly perfect transmissive waveband through it from Visible to SWIR.
© 2019 The Author(s)
You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
Login to access OSA Member Subscription