High Intensity Fiber Lasers: From EUV Lithography to Hard X-Ray Generation

Almantas Galvanauskas

doi:10.1364/NLO.2007.FA1

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Conferences > NLO > 2007 > FA > FA1

Nonlinear Optics: Materials, Fundamentals and Applications
OSA Technical Digest (CD) (Optica Publishing Group, 2007),
paper FA1
•https://doi.org/10.1364/NLO.2007.FA1

High Intensity Fiber Lasers: From EUV Lithography to Hard X-Ray Generation

Almantas Galvanauskas

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Almantas Galvanauskas

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A Galvanauskas

Nonlinear Optics: Materials, Fundamentals and Applications 2007

Kona, Hawaii United States
ISBN: 1-55752-843-8

From the session
Novel Sources and Applications (FA)

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A. Galvanauskas, "High Intensity Fiber Lasers: From EUV Lithography to Hard X-Ray Generation," in Nonlinear Optics: Materials, Fundamentals and Applications, OSA Technical Digest (CD) (Optica Publishing Group, 2007), paper FA1.

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