S-FIL Patterning of Photonics Substrates with Photonic Crystal Structures

Chris Jones; David Wang; Dwayne L. LaBrake

doi:10.1364/NANO.2006.NWB1

Integrated Photonics Research and Applications/Nanophotonics
Technical Digest (CD) (Optica Publishing Group, 2006),
paper NWB1
•https://doi.org/10.1364/NANO.2006.NWB1

S-FIL Patterning of Photonics Substrates with Photonic Crystal Structures

Chris Jones, David Wang, and Dwayne L. LaBrake

Nanophotonics 2006

Uncasville, Connecticut United States
26–28 April 2006
ISBN:

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Photonic Crystals II (NWB)

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C. Jones, D. Wang, and D. L. LaBrake, "S-FIL Patterning of Photonics Substrates with Photonic Crystal Structures," in Integrated Photonics Research and Applications/Nanophotonics, Technical Digest (CD) (Optica Publishing Group, 2006), paper NWB1.

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Abstract

SFIL/R patterning has been used to pattern 100 nm photonic crystal structures on substrates commonly used in the photonics industry. A lithography process is demonstrated through hard mask patterning including on die patterned wafers.

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