Application of Quantum Cascade Laser Absorption Spectroscopy for Correlation Studies in Plasma Etching Processes in the Semiconductor Industry

N. Lang; S. Zimmermann; H. Zimmermann; U. Macherius; B. Uhlig; M. Schaller; S. E. Schulz; J. Röpcke; J. H. van Helden

doi:10.1364/MICS.2018.MT3C.2

High-Brightness Sources and Light-driven Interactions
OSA Technical Digest (online) (Optica Publishing Group, 2018),
paper MT3C.2
•https://doi.org/10.1364/MICS.2018.MT3C.2

Application of Quantum Cascade Laser Absorption Spectroscopy for Correlation Studies in Plasma Etching Processes in the Semiconductor Industry

N. Lang, S. Zimmermann, H. Zimmermann, U. Macherius, B. Uhlig, M. Schaller, S. E. Schulz, J. Röpcke, and J. H. van Helden

Mid-Infrared Coherent Sources 2018

Strasbourg France
26–28 March 2018
ISBN: 978-1-943580-40-8

From the session
Spectroscopy, Microscopy and Biophotonics (MT3C)

Not Accessible

Your library or personal account may give you access

Get PDF
Email
Share
Get Citation
Copy Citation Text
N. Lang, S. Zimmermann, H. Zimmermann, U. Macherius, B. Uhlig, M. Schaller, S. E. Schulz, J. Röpcke, and J. H. van Helden, "Application of Quantum Cascade Laser Absorption Spectroscopy for Correlation Studies in Plasma Etching Processes in the Semiconductor Industry," in High-Brightness Sources and Light-driven Interactions, OSA Technical Digest (online) (Optica Publishing Group, 2018), paper MT3C.2.

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Citation alert
Save article

Abstract

Applying quantum cascade laser absorption spectroscopy a correlation could be demonstrated between the concentration of the etching products SiF₄ and CO and the etching rate of ultra-low-k SiCOH in a low-pressure rf plasma containing CF_4.

PDF Article

More Like This

On Recent Progress in Plasma Diagnostics and Trace Gas Detection Using Infrared Laser Techniques

J. Röpcke, S. Hamann, M. Hannemann, N. Lang, A. Nave, and J. H. van Helden
ETu2A.2 Optics and Photonics for Energy and the Environment (ES) 2016

On Recent Progress Applying Quantum Cascade Lasers in Sensing for Environmental and Plasma Diagnostics

J. H. van Helden, N. Lang, U. Macherius, H. Zimmermann, S. Glitsch, M. Wiese, and J. Röpcke
ETh2A.1 Optics and Photonics for Energy and the Environment (ES) 2015

Applications of MIR-Laser Systems for Plasma Diagnostics and Trace Gas Detection in Basic Research and Industry

J. Röpcke, S. Glitsch, M. Hübner, N. Lang, D. Lopatik, M. Nägele, and A. Rousseau
AS1E.3 Asia Communications and Photonics Conference (ACP) 2012

Previous Article Next Article