Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Reflection Technique for Determination of Nonlinear-refractive Index of Thin-film Semiconductors Using an Electrically Focus-tunable Lens

Not Accessible

Your library or personal account may give you access

Abstract

In this paper, we propose a modification of the F-scan technique, named reflection F-scan, that can be used to measure the nonlinear-refractive index of thin-film and opaque semiconductors, and transparent materials with a measurable-reflectivity signal.

© 2019 The Author(s)

PDF Article
This paper was not presented at the conference

More Like This
Manipulating the Refractive Index of a Fabry-Perot Nanocavity Comprising Thin Semiconductor and Metal Films Using an External Electric Potential

Kirtan P. Dixit, Samantha G. Weckerly, and Don A. Gregory
JTh2A.80 CLEO: Applications and Technology (CLEO:A&T) 2023

Measurement of nonlinear optical Absorption and nonlinear optical refraction in CdS and ZnSe using an electrically focus-tunable lens

Juan Serna, Abdullatif Hamad, Hernando Garcia, and Edgar Rueda
T2C.2 International Conference on Fibre Optics and Photonics (Photonics) 2014

Index Determination for Metallic Thin Films

Michel Cathelinaud, Frédéric Lemarquis, and Claude Amra
TuF1 Optical Interference Coatings (OIC) 2001

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved