Imaging Nonlinear Optical Stokes Ellipsometry for Thin Film and Microparticle Characterization

Nathan J. Begue; Garth J. Simpson

doi:10.1364/LS.2009.LSWH1

Frontiers in Optics 2009/Laser Science XXV/Fall 2009 OSA Optics & Photonics Technical Digest
OSA Technical Digest (CD) (Optica Publishing Group, 2009),
paper LSWH1
•https://doi.org/10.1364/LS.2009.LSWH1

Imaging Nonlinear Optical Stokes Ellipsometry for Thin Film and Microparticle Characterization

Nathan J. Begue and Garth J. Simpson

Laser Science 2009

San Jose, California United States
11–15 October 2009
ISBN: 978-1-55752-878-0

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Second-Order Nonlinear Optics III (LSWH)

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N. J. Begue and G. J. Simpson, "Imaging Nonlinear Optical Stokes Ellipsometry for Thin Film and Microparticle Characterization," in Frontiers in Optics 2009/Laser Science XXV/Fall 2009 OSA Optics & Photonics Technical Digest, OSA Technical Digest (CD) (Optica Publishing Group, 2009), paper LSWH1.

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Abstract

Nonlinear optical Stokes ellipsometry (NOSE) is shown to routinely provide precision of a few parts in 1000 in 12 ms acquisition times for determination of the χ⁽²⁾ tensor elements of thin films, enabling imaging applications with detailed polarization characterization.

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