Abstract

We explore the intimate relationship between quantum lithography, Heisenberg-limited parameter estimation and the rate of dynamical evolution of quantum states. We show how both the enhanced accuracy in measurements and the increased resolution in quantum lithography follow from the use of entanglement. Mathematically, the hyperresolution of quantum lithography appears naturally in the derivation of Heisenberg-limited parameter estimation. We also review recent experiments offering a proof of principle of quantum lithography, and we address the question of state preparation and the fabrication of suitable photoresists. An important branch of quantum mechanics is parameter estimation. Heisenberg’s uncertainty principle seems to prevent us from determining a physical parameter such as a phase with infinite precision, and it is therefore important to understand what are the limits of the estimation process. This will lead us to the concept of quantum lithography and the question of the role of entanglement. Finally, we will review some experiments that show the viability of quantum lithography (at least in principle), and briefly consider the generation of the necessary optical quantum states.

© 2006 Optical Society of America