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Optica Publishing Group
  • International Quantum Electronics Conference
  • OSA Technical Digest (Optica Publishing Group, 1998),
  • paper QWA7

Nonlinear optical properties of silicon nanoclusters made by laser ablation

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Abstract

The nonlinear optical properties of nano-scale semiconductor clusters have developed into a field of increased interest in recent years.1 Many fabrication techniques have been used to prepare nanocluster films, however, the largest χ(3) values (10−3-10−5 esu) have been reported on laser-ablated films.1,2 These films are composed of micron-size droplets that are made of nano-scale clusters. The samples were grown on fused quartz substrates in vacuum via laser ablation using a KrF excimer laser (λ = 248 nm, Pavg = 3W, τP = 8 ns, rep. rate = 50' Hz) and a silicon wafer target (〈100〉), n-type 1016 cm−3). X-ray diffraction indicates that the films are made of nano-size crystallites. The information on the clusters within the droplets was gathered indirectly by μ,-Raman spectroscopy.3 Nanosecond excitation experiments1 revealed a lifetime of the transition at λ = 532 nm of approximately 5 ns, limited by the laser pulse duration. Amorphous or polycrystalline silicon films have never exhibited such a high value of χ(3) although lifetime values of that order have been reported in the past. The origin of the large nonlinearity is still a mystery.

© 1998 Optical Society of America

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