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Optica Publishing Group
  • International Quantum Electronics Conference
  • OSA Technical Digest (Optica Publishing Group, 1998),
  • paper QThD3

Atom lithography using standing-wave quenching

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Abstract

We used spatially dependent optical pumping in a standing wave to create nanostructures using metastable argon and resist-based atom lithography. Although the localization is caused by spontaneous emission, the matter wave diffraction and the mechanical effects of the light affect the resulting atomic localization. We investigate (a) the role of the spontaneous emission, including the effect of a nonideal, single-emission quenching probability; (b) transverse and longitudinal velocity spreads in the atomic beam; and (c) the optimization of interaction distance and laser detuning for finite laser power and minimum atomic dosage requirements.

© 1998 Optical Society of America

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