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  • International Quantum Electronics Conference
  • OSA Technical Digest (Optica Publishing Group, 1986),
  • paper THDD2

Spontaneous ripple formation due to ultraviolet surface oxidation of semiconductors

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Abstract

Many laser microchemical processes are influenced by interactions between surface electro-magnetic waves, which are excited by laser radiation, and wavelength-scale surface morphology.1-3 This effect has not been extensively documented in laser processing of semiconductors in which low laser intensities have been used.4 We report the formation of subwavelength ripples on semiconductor surfaces during low-power cw UV laser illumination.

© 1986 Optical Society of America

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