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A Shallow-Etched Distributed-Grating Wavelength Demultiplexer in SOI

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Abstract

A shallow-etched, distributed grating is proposed as a wavelength demultiplexer. Modeling results predict up to 94% efficiency over a 120nm wavelength range. Early fabrication results, using electron-beam lithography and electron-cyclotron-resonance single-step etching, are presented.

© 2006 Optical Society of America

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