Abstract
A shallow-etched, distributed grating is proposed as a wavelength demultiplexer. Modeling results predict up to 94% efficiency over a 120nm wavelength range. Early fabrication results, using electron-beam lithography and electron-cyclotron-resonance single-step etching, are presented.
© 2006 Optical Society of America
PDF ArticleMore Like This
Yang Chen, Jun zou, Tingting Lang, and Jian-Jun He
ASu2A.22 Asia Communications and Photonics Conference (ACP) 2015
Ning Zhu, Jun Song, Lech Wosinski, and Sailing He
SuE4 Asia Optical Fiber Communication and Optoelectronic Exposition and Conference (ACP) 2008
Pingli Huang, Jun Zou, Ge Mu, Xiang Xia, Tingting Lang, and Jian-Jun He
ATh3A.13 Asia Communications and Photonics Conference (ACP) 2014