Abstract
The evolution of optical networks towards flexible many-wavelength systems with high data rates creates the need for a variety of novel optical devices. Reconfigurable optical components are required to re-route wavelength channels, and tunable compensating filter devices are necessary to control the optical properties of the signal carriers such as power, chromatic dispersion (CD) and polarization-mode dispersion (PMD). Silica-on-silicon planar waveguide technologies offer an ideal platform for the realization of such tunable components because of the excellent optical properties and compatibility with IC manufacturing tools. However, with increasing complexity, devices can become large with respect to the wafer size, which increases device cost. This can be overcome by a high-index-contrast silica technology. The small minimum bending radius leads to a reduced device size, and the overall reduction in waveguide dimensions results in a reduced processing time for deposition and etching. In this paper, we describe our high-index contrast technology based on silicon-oxynitride (SiON), and present two device examples.
© 2003 Optical Society of America
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