Abstract
This paper outlines our work in the area of Photonic Crystal fabrication using silicon processing techniques. Current silicon processing technologies are readily able to pattern the minimum feature sizes required for optical frequencies. A wide variety of different structures have been demonstrated and the level of process control is excellent. Examples are given of one and three-dimensional photonic crystals as well as the integration of other materials such as tungsten and erbium.
© 2002 Optical Society of America
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