Optimized Si-on-LiNbO3 Waveguide Reflectors with Low Loss and Record-High Reflectance

Hao Feng; Robert F. Tavlykaev; Ramu V. Ramaswamy

doi:10.1364/IPR.1999.RTuG4

Integrated Photonics Research
OSA Technical Digest Series (Optica Publishing Group, 1999),
paper RTuG4
•https://doi.org/10.1364/IPR.1999.RTuG4

Optimized Si-on-LiNbO₃ Waveguide Reflectors with Low Loss and Record-High Reflectance

Hao Feng, Robert F. Tavlykaev, and Ramu V. Ramaswamy

Integrated Photonics Research 1999

Santa Barbara, California United States
ISBN: 1-55752-586-2

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H. Feng, R. F. Tavlykaev, and R. V. Ramaswamy, "Optimized Si-on-LiNbO3 Waveguide Reflectors with Low Loss and Record-High Reflectance," in Integrated Photonics Research, OSA Technical Digest Series (Optica Publishing Group, 1999), paper RTuG4.

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Abstract

While high-reflectance gratings in ferroelectrics, such as LiNbO₃ and the like, are desired, for example, for waveguide laser applications [1], the inherent difficulties of making efficient gratings in these high-index, etching resistant, materials has long hindered progress.

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