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Conferences > IPR > 1999 > RTuE > RTuE1

Photonic microstructures: a key approach for high density integrated optoelectronics

R.M. De La Rue, C.J.M. Smith, C.D.W. Wilkinson, T.F. Krauss, H. Benisty, C. Weisbuch, D. Labilloy, R. Houdré, M. Illegems, and U. Oesterle

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Abstract

One-dimensional and two-dimensional grating structures which, in their in-plane operation, approximate closely to true photonic bandgap behaviour have been fabricated using a combination of high-resolution, direct-write, electron-beam lithography (EBL) and reactive ion etching (REE) [1,2].

© 1999 Optical Society of America

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