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Design and optical field simulation of Ti-diffused LiNbO3 single-mode ridge waveguides

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Abstract

The field intensity profiles of the fundamental transverse electric (TE) modes in the two types of Ti-diffused LiNbO3 single-mode ridge waveguides were simulated at λ = 1310 nm. The results indicate that the ridge waveguide fabricated by etching a LiNbO3 slab waveguide has a stronger optical confinement than that made by etching a LiNbO3 channel waveguide.

© 2012 Optical Society of America

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