Using Orientation Zernike Polynomials to predict the imaging performance of optical systems with birefringent and partly polarizing components

Johannes Ruoff; Michael Totzeck

doi:10.1364/IODC.2010.IWA3

International Optical Design Conference and Optical Fabrication and Testing
OSA Technical Digest (CD) (Optica Publishing Group, 2010),
paper IWA3
•https://doi.org/10.1364/IODC.2010.IWA3

Using Orientation Zernike Polynomials to predict the imaging performance of optical systems with birefringent and partly polarizing components

Johannes Ruoff and Michael Totzeck

International Optical Design Conference 2010

Jackson Hole, Wyoming United States
13–17 June 2010
ISBN: 978-1-55752-893-3

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Polarization in Optical Design (IWA)

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J. Ruoff and M. Totzeck, "Using Orientation Zernike Polynomials to predict the imaging performance of optical systems with birefringent and partly polarizing components," in International Optical Design Conference and Optical Fabrication and Testing , OSA Technical Digest (CD) (Optica Publishing Group, 2010), paper IWA3.

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Abstract

We use the concept of Orientation Zernike Polynomials, which have been shown to provide a complete and systematic description of vector imaging, to predict the polarization performance of high NA lithography lenses.

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