The Optical Design for Microlithographic Lenses

Yasuhiro Ohmura

doi:10.1364/IODC.2006.WD5

International Optical Design Conference 2006

Vancouver Canada
4–8 June 2006
ISBN: 1-55752-811-X

From the session
Infrared and Lithographic Design and Systems (WD)

The Optical Design for Microlithographic Lenses

Yasuhiro Ohmura

International Optical Design
Technical Digest (CD) (Optical Society of America, 2006),
paper WD5
•https://doi.org/10.1364/IODC.2006.WD5

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Y. Ohmura, "The Optical Design for Microlithographic Lenses," in International Optical Design, Technical Digest (CD) (Optical Society of America, 2006), paper WD5.

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Abstract

The evolution of the microlithographic lens is described based on an analysis of main features of the lenses in each generation. Even current lenses, comprising more than 20 elements, can be understandable through the analysis.

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International Optical Design Conference 2006

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