Extreme Ring Fields in Microlithography

Alexander Epple

doi:10.1364/IODC.2006.WD3

International Optical Design
Technical Digest (CD) (Optica Publishing Group, 2006),
paper WD3
•https://doi.org/10.1364/IODC.2006.WD3

Extreme Ring Fields in Microlithography

Alexander Epple

International Optical Design Conference 2006

Vancouver Canada
4–8 June 2006
ISBN: 1-55752-811-X

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Infrared and Lithographic Design and Systems (WD)

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A. Epple, "Extreme Ring Fields in Microlithography," in International Optical Design, Technical Digest (CD) (Optica Publishing Group, 2006), paper WD3.

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Abstract

A new inline catadioptric design type is presented which is designed for use with extreme ring field geometries. This allows to increase the numerical aperture to the physical limits both in dry and immersion lithography.

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