A novel fabrication technique of Silicon nanowires using excimer laser is developed in this work. Using one-step and easily scalable method, array of nanowires with broadband absorption enhancement are formed without etching the deposited material.

© 2018 The Author(s)

PDF Article


You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
Login to access OSA Member Subscription