Sub-Diffraction Feature Size in Conventional I-Line Photoresists

David B. Miller; Adam M. Jones; Robert R. McLeod

doi:10.1364/FIO.2017.FTh3D.5

Frontiers in Optics 2017
OSA Technical Digest (online) (Optica Publishing Group, 2017),
paper FTh3D.5
•https://doi.org/10.1364/FIO.2017.FTh3D.5

Sub-Diffraction Feature Size in Conventional I-Line Photoresists

David B. Miller, Adam M. Jones, and Robert R. McLeod

Frontiers in Optics 2017

Washington, D.C. United States
18–21 September 2017
ISBN: 978-1-943580-33-0

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Instrumentation for Optical Devices and Systems (FTh3D)

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D. B. Miller, A. M. Jones, and R. R. McLeod, "Sub-Diffraction Feature Size in Conventional I-Line Photoresists," in Frontiers in Optics 2017, OSA Technical Digest (online) (Optica Publishing Group, 2017), paper FTh3D.5.

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Abstract

Applying a technique from super-resolution microscopy to photolithography, we achieve feature sizes below the diffraction limit. Using conventional i-line photoresists exposed with near UV, we demonstrate individual feature sizes below 100 nm.

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