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  • Frontiers in Optics 2009/Laser Science XXV/Fall 2009 OSA Optics & Photonics Technical Digest
  • OSA Technical Digest (CD) (Optica Publishing Group, 2009),
  • paper FTuS1
  • https://doi.org/10.1364/FIO.2009.FTuS1

EUV Lithography

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Abstract

EUV lithography promises to be the next, and maybe the last technology to extend Moore's Law fabrication of computer chips. We review the development, status and challenges this technology faces as it nears implementation.

© 2009 Optical Society of America

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